Micro-Metric installs measurement system at Samsung facility

JANUARY 10--Micro-Metric Inc. (San Jose, CA; www.micro-metric.com), a manufacturer of high-accuracy, noncontact measurement and assembly systems, has completed the installation of an INNOVA-D critical dimension measurement system at Samsung SAIT Micro Engineering Center, a research & development facility based in Suwon, Korea. Samsung SAIT has purchased the system as part of its ongoing MEMS research. This installation is reflective of the growing worldwide customer base of Micro-Metric, as it is the first INNOVA-D to be shipped to Korea.

INNOVA-D is a fully automated, noncontact critical dimension measurement system that provides both depth and linewidth measurement for semiconductor wafers. The system features a confocal microscope for extremely precise width and depth measuring, along with an automatic wafer handler with prealigner, motorized nosepiece, and pattern recognition. INNOVA-D automatically loads wafers, detects alignment features, and performs measurements without operator assistance. A hand-lapped x-y stage with laser interferometer positional feedback provides 0.25-μm stage positional accuracy per 4 in. of travel. The system is capable of measuring linewidths from 0.5 to 40 μm at 100X, and 10 to 800-μm at 5X. Linewidth measurement repeatability is <2 nm (1 Sigma), and depth measurement repeatability is <10 nm (1 sigma). A vibration isolation platform is standard.