Lithography laser powers full-field 157-nm step-and-scan tool

MAY 15--The first of several Lambda Physik USA Inc. (Ft. Lauderdale, FL; www.lambdaphysik.com) NovaLine F2020 lasers has been delivered to an independent research-and-development chip consortium in Europe.

May 15th, 2003

MAY 15--The first of several Lambda Physik USA Inc. (Ft. Lauderdale, FL; www.lambdaphysik.com) NovaLine F2020 lasers has been delivered to an independent research-and-development chip consortium in Europe. The laser is used to illuminate a full-field 157-nm step-and-scan tool. Additional deliveries to semiconductor manufacturers are expected later in 2003.

Now, 193-nm is the wavelength of choice in leading-edge microlithography. Lambda Physik's 157-nm technology is playing a key role in extending optical lithography to the 50-nm design node. Delivering 20 W of line-selected laser power at a 2-kHz pulse rate, Novaline F2020 will help drive the design shrink of future microprocessor and memory chips.

"Full-field" refers to the size of the scanner's exposure field area, which is 26 x 34 mm. It offers an increased photoresist process range, flexible imaging, and contamination control, and purge.

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