IC inspection microscope attachment offers real-time confocal imaging

FEBRUARY 5--Nikon (Melville, NY; www.nikonusa.com) has introduced a new confocal module attachment for its Eclipse L200 Series microscopes that combines the advantages of both confocal imaging and CFI60 optics.

FEBRUARY 5--Nikon (Melville, NY; www.nikonusa.com) has introduced a new confocal module attachment for its Eclipse L200 Series microscopes that combines the advantages of both confocal imaging and CFI60 optics. This allows submicron confocal inspection using new LU Series CFI60 objectives, which exceed the working distance of the previous series without the loss of numerical aperture (NA). The new module also features increased resolving power and height discrimination.

Confocal images are visible in real time through the eyepieces and also the vertical port for video, film, or digital photography. There are two confocal modes: CF1 (larger pinholes for brightness) and CF2 (smaller pinholes for increased confocal effect). This module also features a tilting binocular tube, a vertical port for video, a 2:1 intermediate zoom for the eyepieces and vertical port, plus a HMX bayonet mount for mercury illumination of the confocal disk. Illumination for conventional observation (brightfield, darkfield, and DIC) is through the normal L200 illumination system.

The confocal module now provides the ability to resolve linewidths below 0.2 nm, to approximately 180 nm with dry objectives using NA 0.95. The 150x (NA 1.2) water-immersion objective lens can be used to observe linewidths below 150 nm for failure analysis. Used either independently or in combination with a wafer loader in an automated system, the L200 series is designed to view, image, and document wafers, photo masks, reticles, and a variety of substrates--all with exceptional precision. These microscopes can accommodate wafers up to 8 in. in diameter and masks up to 6 in. in diameter.

Nikon's patented CFI60 infinity optical system offers images with better clarity, higher contrast, and minimal flare, while providing the industry's best ergonomics, safety, and cleanliness. The system offers professionals in IC design, engineering, and manufacturing the best optical corrections, longest working distances, and highest light microscopy performance level available overall. It is designed to accommodate the most advanced requirements of today's laboratories.

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