Imaging-analysis software aids atomic-force microscopy

MARCH 17--Pacific Nanotechnology Inc. (Santa Clara, CA; www.pacificnanotech.com), a supplier of atomic-force microscopes (AFMs), has released its NanoRule+ software for its Nano-R and Nano-I AFMs. The image-display and analysis software brings PC computer graphics tools to the AFM user. With NanoRule+ software, AFM users can incorporate intuitive imaging capabilities to facilitate nanotechnology research and development efforts.

NanoRule+ combines the three functions essential for AFM graphics software: image display, image processing, and image analysis. This software takes advantage of the capabilities of the Open GL graphics software environment combined with fast AGP (Accelerated Graphics Port) video 3-D display hardware. NanoRule+ provides an Image Work Window similar to popular graphics and image editing software, with options for rapid display, analysis, and visualization of AFM images. Users will benefit from 2- and 3-D image display; error correction; leveling; line analysis; line and area roughness analysis; contrast, brightness, and gamma adjustment; filtering; scaling and zooming; and variable light shading that gives a photorealistic view.

Nano-I is an AFM for inspection and metrology of nanodevice wafers and storage media disks. It has applications in R&D, process development, failure analysis, and quality assurance for MEMS and semiconductor devices, data-storage media, magnetic read/write heads, and photonic devices. Nano-R serves AFM for R&D and industrial labs with applications in metallurgy, nanoparticles and powders, filters, semiconductor/data storage, photonics, and adhesives.