Line Scan Imaging System Introduced

Sept. 2, 2022
The camera system is designed to detect sub-pixel sized defects on silicon wafers—even those with reflective surfaces or small chipsets.

Chromasens has launched a machine vision system that detects defects on silicon wafers invisible to the naked eye, such as sub-pixel sized scratches, cracks, and stains. The wafer inspection system comprises a Chromasens allPIXA evo 15 k CxP4 mono camera, Myutron XLS05 lenses, an XCL4 LED controller, and Corona II lighting with coaxial light modules for dark field and bright field illumination. The allPIXA evo 15 k CxP4 mono camera is equipped with a trilinear CMOS line scan sensor. Compatible with the CoaXPress (CXP) interface, the camera achieves full resolution of 15 k at line rates up to 68.4 kHz. The allPIXA evo 15 k CxP4 camera included with the system can trigger up to four different flash controller channels synchronized to its line acquisition using a multi-channel LED flash. By integrating both Corona II bright field and dark field illumination, the system acquires multiple lighting conditions in one scan of the wafer. Users can choose from a variety of options, including the number of cameras, color or mono imaging, field of view (FOV), and the illumination setup.

 To Learn More:

Contact: Chromasens 

Headquarters: Konstanz, Germany

Product: wafer inspection system

Key Features: Compatible with the CoaXPress interface, Full resolution of 15 k at line rates up to 68.4 kHz, trilinear CMOS line scan sensor         

What Chromasens says:

View more information on the wafer inspection system

Share your vision-related news by contacting Chris Mc Loone, Editor in Chief, Vision Systems Design.


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