FEI introduces three transmission electron microscopy systems

Sept. 5, 2013
FEI has introduced three fully-integrated and automated transmission electron microscopy (TEM) systems designed for specific application and industry needs.

FEI has introduced three transmission electron microscopy (TEM) systems designed for specific application and industry needs. FEI’s Metrios system provides measurements that semiconductor manufacturers need to develop and control their wafer fabrication processes. The Talos system is built to deliver access to 2D and 3D data and provides configurations for materials research and life sciences research. Lastly, the Titan Themis system was designed for enhanced atomic-scale measurements of material properties. FEI’s TEM systems feature fully integrated and automated operation for a range of applications requiring ultra-high resolution to sub-Ångström levels.

To Learn More:

Contact: FEI
: Hillsboro, OR, USA
Three new transmission electron microscopy systems
Key Features:
Advanced semiconductor manufacturing metrology (Metrios), high-speed imaging and analysis for materials and life sciences applications (Talos), enhanced atomic-sale measurements of material properties (Titan Themis).

What FEI says:
View more information on FEI’s TEM systems.

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About the Author

James Carroll

Since joining the team 2013, James covered machine vision and imaging from numerous angles, including application stories, industry news, market updates, and new products. In addition to writing and editing articles for each issue of the magazine, James managed the Innovators Awards program and webcasts.

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