CRAIC microspectrophotometer enables analysis of features of large samples

CRAIC’s 20/30 XL microspectrophotometer was designed to acquire spectra, images, and film thickness measurements of microscopic features of large scale samples. It is suitable for use in semiconductor film thickness measurements and other micro-analysis applications for laboratories and manufacturing facilities.

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CRAIC’s 20/30 XL microspectrophotometer was designed to acquire spectra, images, and film thickness measurements of microscopic features of large scale samples. (XL= extra large). It supports the measurement of UV-visible-NIR range transmission, absorbance, reflectance, emission, and fluorescence spectra of features smaller than a micron across. It features a spectral range of 200 to 2100 nm and also facilitates Raman microspectroscopy, high resolution UV microscopy, and NIR microscopy. In addition, it is enabled for manual or fully automated operation and features integrated thermoelectric cooled array detectors. The 20/30 XL is suitable for use in semiconductor film thickness measurements, colorimetry of flat panel displays, intensity mapping of flat panel displays, and other micro-analysis applications for laboratories and manufacturing facilities.

To Learn More:

Contact:CRAIC Technologies
Headquarters: San Dimas, Calif., United States
Product:
20/30 XL microspectrophotometer
Key Features:
Microspot analysis of large scale samples, spectral range of 200 – 2100 nm, UV-visible-NIR transmission microspectroscopy, , UV-visible-NIR transmission imaging, Raman microspectroscopy.

What CRAIC says:
View more information on the 20/30 XL microspectrophotometer.

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