OCTOBER 19--AMI Semiconductor (AMIS; Pocatello, ID, USA), a designer and manufacturer of integrated mixed-signal and structured digital products, and FLIR Systems (Portland, OR, USA), a developer of commercial infrared (IR) technology, have announced an agreement for high-volume manufacturing of uncooled microbolometer IR detectors. Under the agreement, FLIR will install its proprietary microbolometer detector process at AMIS's Class 1, eight-inch fabrication facility in Pocatello. The agreement will expand current microbolometer-detector manufacturing capability and will also provide an opportunity to improve sensor yield by installing the process in a Class 1 fabrication facility.
The implementation of FLIR's proprietary microbolometer production process further demonstrates AMIS's value as a foundry for complex semiconductor components. The growth of thermal-imaging equipment in both the commercial and military markets, requires the high-volume, high-yield, and low-cost capabilities that the foundry model offers. AMI Semiconductor's mixed-signal process, manufacturing expertise, and quality certifications make the company an excellent source for FLIR's microbolometer arrays.
FLIR Systems designs, manufactures, and markets thermal-imaging and stabilized camera systems for a variety of thermography and imaging applications including condition monitoring, research and development, manufacturing process control, airborne observation and broadcast, search and rescue, drug interdiction, surveillance and reconnaissance, navigation safety, border and maritime patrol, environmental monitoring and ground-based security. Visit the company's Web site at www.flir.com.
AMIS European corporate offices are in Oudenaarde, Belgium, and a network of sales and design centers are located in North America, Europe, and the Asia-Pacific region.
